Inventor

Wataru Fujimatsu

Inventor
Hino, JP

Overview

11→
Patents
1977–1985
Patent span
Physics
Primary field (CPC G)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Cprimary
G03CPhotosensitive materials for photographic purposes53%
C07DHeterocyclic compounds21%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
C07CAcyclic or carbocyclic compounds5%
G11BInformation storage based on relative movement between record carrier and transducer5%
Y10TTechnical subjects covered by former us classification5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977–1985Patents assigned to KONISHIROKU PHOTO IND (10)· patent assignee history
1977–1985Based in Hino, JP· patent location history
1977–1983Based in Hachioji, JP· patent location history
1981Patents assigned to FUJIMATSU WATARU (1)· patent assignee history
1981Patents assigned to MATSURA KATSUMI (1)· patent assignee history
1981Patents assigned to SASAKI OSAMU (1)· patent assignee history
1981Patents assigned to USAGAWA YASUSHI (1)· patent assignee history
1981Based in Sakura-machi, Hino-shi, Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KONISHIROKU PHOTO IND101977–1985
FUJIMATSU WATARUself11981
MATSURA KATSUMI11981
SASAKI OSAMU11981
USAGAWA YASUSHI11981
Locations
LocationPatentsSpan
Hino, JP51977–1985
Hachioji, JP51977–1983
Sakura-machi, Hino-shi, Tokyo, JP11981