Inventor

Setsuo Tsuruoka

Inventor

Amagasaki, JP

Overview

1984

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C02Fprimary

C02FTreatment of water, waste water, sewage, or sludge50%

C23FNon-mechanical removal of metallic material from surface50%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1984Patents assigned to KOHRYU IND CO LTD (1)· patent assignee history

1984Patents assigned to TOA GOSEI CHEM IND (1)· patent assignee history

1984Based in Amagasaki, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
KOHRYU IND CO LTD	1	1984
TOA GOSEI CHEM IND	1	1984

Locations

Location	Patents	Span
Amagasaki, JP	1	1984