Inventor
Scott Falk
Inventor
US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
C23CCoating metallic material17%
H01JElectric discharge tubes or discharge lamps13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
PatentTitleYear
12,444,615Forming a doped hardmask202512,112,949Highly etch selective amorphous carbon film202412,014,927Highly etch selective amorphous carbon film202411,875,995Techniques and apparatus for anisotropic stress compensation in substrates using ion implantation202411,551,904System and technique for profile modulation using high tilt angles202311,469,107Highly etch selective amorphous carbon film202211,201,057Techniques and apparatus for anisotropic stress compensation in substrates using ion implantation2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to APPLIED MATERIALS INC (7)· patent assignee history
2021–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 7 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 7 | 2021–2025 |