Inventor
Yukio Minami
Inventor
Osaka, JP
Overview
34→
Patents
1995–2013
Patent span
General tagging of new technological developments
Primary field (CPC Y)
Patents· 34 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
Y10Tprimary
Y10TTechnical subjects covered by former us classification22%
C01BNon-metallic elements15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry12%
F16KValves11%
G05DSystems for controlling or regulating non-electric variables10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
B01DSeparation2%
F17DPipe-line systems2%
C23CCoating metallic material1%
PatentTitleYear
8,469,046'Method for parallel operation of reactors that generate moisture'20137,815,872'Reactor for generating moisture and moisture generating and feeding apparatus for which the reactor is employed'20107,673,649'Vacuum thermal insulating valve'20107,595,087'Process of forming platinum coating catalyst layer in moisture-generating reactor'20097,553,459'Apparatus and reactor for generating and feeding high purity moisture'20097,368,092'Apparatus and reactor for generating and feeding high purity moisture'20087,258,845'Apparatus and reactor for generating and feeding high purity moisture'20077,103,990'Rotary silicon wafer cleaning apparatus'20067,008,598'Reactor for generating moisture'20066,919,056'Reactor for generating moisture'20056,848,470'Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus'20056,820,632'Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus'20046,733,732'Reactor for generating moisture'20046,622,543'Gas detection sensor'20036,422,264'Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus'20026,408,879'Fluid control device'20026,387,158'Method of removing moisture in gas supply system'20026,334,962'Low flow rate moisture supply process'20026,274,098'Apparatus for the treatment of exhaust gases by combining hydrogen and oxygen'20016,257,270'Fluid control device'20016,178,995'Fluid supply apparatus'20016,180,067'Reactor for the generation of water'20016,093,662'Method for generating water for semiconductor production'20006,060,691'Device for heating fluid controller'20006,014,498'Device for heating fluid control apparatus'20005,983,933'Shutoff-opening device'19995,975,112'Fluid control device'19995,950,675'Backflow prevention apparatus for feeding a mixture of gases'19995,816,285'Pressure type flow rate control apparatus'19985,791,369'Pressure type flow rate control apparatus'19985,669,408'Pressure type flow rate control apparatus'19975,488,967'Method and apparatus for feeding gas into a chamber'19965,427,357'Control valve'19955,379,982'Control valve'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2013Patents assigned to FUJIKIN KK (32)· patent assignee history
1995–2013Based in Osaka, JP· patent location history
1998–2005Patents assigned to OHMI TADAHIRO (11)· patent assignee history
1999–2005Patents assigned to TOKYO ELECTRON LTD (5)· patent assignee history
2001–2006Patents assigned to TADAHIRO OHMI (3)· patent assignee history
2013Patents assigned to HIRAO KEIJI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIKIN KK | 32 | 1995–2013 |
| OHMI TADAHIRO | 11 | 1998–2005 |
| TOKYO ELECTRON LTD | 5 | 1999–2005 |
| TADAHIRO OHMI | 3 | 2001–2006 |
| HIRAO KEIJI | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Osaka, JP | 34 | 1995–2013 |