Inventor
Takeshi Inasaki
Inventor
Shizuoka, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds19%
C09DCoating compositions, e.g. paints, varnishes or lacquers12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments7%
B41CProcesses for the manufacture or reproduction of printing surfaces5%
B41NPrinting plates or foils2%
B82YSpecific uses or applications of nanostructures2%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium2%
C09KMaterials for miscellaneous applications, not provided for elsewhere2%
PatentTitleYear
11,117,364Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and compound202110,921,712Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and color developing compound20219,826,129'Near-infrared-ray-absorbing composition, near-infrared-ray cut filter using same, manufacturing method therefor, camera module, and manufacturing method therefor'20179,563,121'Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition'20179,285,679'Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition'20169,235,116'Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern'20169,235,120'Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask'20169,223,204'Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same'20159,091,927'Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition'20158,895,222'Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition'20148,735,048'Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method'20148,673,538'Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition'20148,614,033'Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition'20138,574,814'Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition'20138,329,379'Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2021Patents assigned to FUJIFILM CORP (14)· patent assignee history
2012–2015Patents assigned to INASAKI TAKESHI (7)· patent assignee history
2012–2015Patents assigned to TSUCHIMURA TOMOTAKA (7)· patent assignee history
2012–2015Patents assigned to ITO TAKAYUKI (4)· patent assignee history
2012–2015Patents assigned to KATAOKA SHOHEI (3)· patent assignee history
2012–2017Based in Haibara-gun, JP· patent location history
2014–2021Based in Shizuoka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 14 | 2012–2021 |
| INASAKI TAKESHIself | 7 | 2012–2015 |
| TSUCHIMURA TOMOTAKA | 7 | 2012–2015 |
| ITO TAKAYUKI | 4 | 2012–2015 |
| KATAOKA SHOHEI | 3 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 9 | 2014–2021 |
| Haibara-gun, JP | 6 | 2012–2017 |