Inventor
Eugene A. DeLaRosa
Inventor
Boise, ID, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
B82YSpecific uses or applications of nanostructures29%
H01JElectric discharge tubes or discharge lamps29%
G06TImage data processing or generation, in general7%
PatentTitleYear
7,095,885'Method for measuring registration of overlapping material layers of an integrated circuit'20066,818,910'Writing methodology to reduce write time, and system for performing same'20046,713,233'Multiple pass write method and reticle'20046,642,530'Multiple pass write method and reticle'20036,472,123'Multiple pass write method and reticle'20025,049,925'Method and apparatus for focusing a wafer stepper'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2006Patents assigned to MICRON TECHNOLOGY INC (6)· patent assignee history
1991–2006Based in Boise, ID, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 6 | 1991–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 6 | 1991–2006 |