Inventor
Friedrich Seitz
Inventor
Friedelsheim, DE
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Lprimary
C08LCompositions of macromolecular compounds33%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
B01FMixing, e.g. dissolving, emulsifying or dispersing3%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
B29CShaping or joining of plastics3%
C07BGeneral methods of organic chemistry3%
C07CAcyclic or carbocyclic compounds3%
PatentTitleYear
5,817,266'Dewatering of water-moist graft rubber'19985,773,651'Process for the preparation of fluorine-containing chemical compounds'19985,475,053'Molding composition having a matt surface'19955,446,094'Thermoplastic coupling agent mixture'19955,444,123'Halogen-free flameproofed thermoplastic molding materials based on polyphenylene ethers and polystyrene'19955,399,620'Block copolymers of acrylate and methacrylate units'19955,344,877'Molding material from a particulate graft polymer'19945,342,898'Particulate graft polymer, and thermoplastic molding material produced therefrom having improved toughness'19945,336,718'Impact modifier and molding material containing it'19945,276,256'Flameproofed chlorine-and bromine-free molding composition'19945,266,638'Toughened thermoplastic molding material'19935,252,666'Particulate graft polymer with improved adhesion between grafting base and graft sheath'19935,219,907'Flameproofed molding composition'19935,196,480'Thermoplastic molding material based on graft copolymers with bimodal particle size distribution and a two-step graft shell'19935,176,985'Reaction product, preparation thereof and radiation-sensitive material obtained therewith'19935,120,788'Hermoplastic molding material of improved toughness'19925,114,831'Photopolymerizable laminating material'19924,962,011'Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon'19904,940,649'Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon'19904,908,448'4-Quinazolone compounds'19904,891,301'Photopolymerizable recording materials, photoresist layers and lithographic printing plates based theron, and novel 4-quinazolone compounds'1990Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1990–1998Patents assigned to BASF AG (20)· patent assignee history
1990–1998Based in Friedelsheim, DE· patent location history
1998Patents assigned to HOECHST AG (1)· patent assignee history
1998Based in Eschborn, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| BASF AG | 20 | 1990–1998 |
| HOECHST AG | 1 | 1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Friedelsheim, DE | 20 | 1990–1998 |
| Eschborn, DE | 1 | 1998 |