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Inventor

KUO-CHIN LIN

Inventor
TW

Overview

2→
Patents
2024–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H01LSemiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
12,411,404Method of manufacturing phase shift photo masks202511,906,898Method of manufacturing phase shift photo masks2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (2)· patent assignee history
2024–2025Based in TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD22024–2025
Locations
LocationPatentsSpan
TW22024–2025