Inventor

Yim-Bun Patrick Kwan

Inventor

Aalen, DE

Overview

2001–2021

Patent span

Physics

Primary field (CPC G)

Patents· 82 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%

G02BOptical elements, systems or apparatus22%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%

G01MTesting static or dynamic balance of machines or structures4%

G01BMeasuring length, thickness or similar linear dimensions3%

G21KHandling of particles or ionising radiation not otherwise provided for3%

G01NInvestigating or analysing materials by determining their chemical or physical properties3%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%

G05BControl or regulating systems in general3%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

PatentTitleYear

11,030,077Framework for testing and validating content generated by applications2021 10,732,402Optical imaging arrangement with a piezoelectric device2020 10,684,551EUV exposure apparatus with reflective elements having reduced influence of temperature variation2020 10,317,802EUV exposure apparatus with reflective elements having reduced influence of temperature variation2019 10,197,925Optical module for a microlithography objective holding optical elements with supporting devices located in a non-equidistant manner2019 10,175,581Optical apparatus with adjustable action of force on an optical module2019 10,139,733Diaphragm changing device2018 10,108,094Projection exposure apparatus with near-field manipulator2018 10,095,120Vibration-compensated optical system, lithography apparatus and method2018 10,031,423EUV exposure apparatus with reflective elements having reduced influence of temperature variation2018 9,977,228Optical module for a microlithography objective holding optical elements with supporting device located in non-equidistant manner2018 9,976,931Optical imaging arrangement with multiple metrology support units2018 9,933,707Optical apparatus for use in photolithography2018 9,897,925'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'2018 9,891,534'Optical imaging arrangement with multiple metrology support units'2018 9,829,808Method for controlling a motion of optical elements in lithography systems2017 9,766,549'Optical apparatus with adjustable action of force on an optical module'2017 9,746,778'EUV exposure apparatus with reflective elements having reduced influence of temperature variation'2017 9,696,630'Lithographic apparatus and device manufacturing method'2017 9,551,940'Lens comprising a plurality of optical element disposed in a housing'2017 9,535,336'Microlithographic projection exposure apparatus'2017 9,477,092'Optical imaging arrangement with individually actively supported components'2016 9,436,101'Optical arrangement and microlithographic projection exposure apparatus including same'2016 9,383,544'Optical system for semiconductor lithography'2016 9,366,976'Optical element with low surface figure deformation'2016 9,316,929'EUV exposure apparatus with reflective elements having reduced influence of temperature variation'2016 9,316,930'Low-contamination optical arrangement'2016 9,298,111'Optical arrangement in a projection exposure apparatus for EUV lithography'2016 9,239,229'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'2016 9,134,632'Lithographic apparatus and device manufacturing method'2015 9,097,985'Lens comprising a plurality of optical element disposed in a housing'2015 9,030,647'Optical imaging arrangement with vibration decoupled support units'2015 9,019,475'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'2015 9,013,684'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'2015 9,001,309'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'2015 8,964,165'Optical apparatus with adjustable action of force on an optical module'2015 8,885,141'EUV lithography device and method for processing an optical element'2014 8,767,176'Microlithographic projection exposure apparatus'2014 8,717,534'Lens comprising a plurality of optical element disposed in a housing'2014 8,711,331'Optical module for a microlithography objective including holding and supporting devices'2014 8,587,765'Optical imaging device with determination of imaging errors'2013 8,570,676'Optical assembly'2013 8,416,392'Optical imaging arrangement'2013 8,339,577'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'2012 8,269,947'Optical system for semiconductor lithography'2012 8,089,707'Diaphragm changing device'2012 8,072,700'Optical apparatus for use in photolithography'2011 8,065,103'Calibration of a position measuring device of an optical device'2011 8,018,664'Housing structure'2011 7,995,884'Device consisting of at least one optical element'2011 7,986,472'Optical element module'2011 7,940,392'Lithographic apparatus, device manufacturing method and device manufactured thereby'2011 7,929,227'Optical assembly'2011 7,817,248'Optical imaging arrangement'2010 7,791,826'Optical assembly'2010 7,760,327'Reflecting optical element with eccentric optical passageway'2010 7,692,881'Structure for use in a projection exposure system for manufacturing semiconductors'2010 7,633,619'Calibrating a lithographic apparatus'2009 7,603,010'Device consisting of at least one optical element'2009 7,589,921'Actuator device'2009 7,561,270'Lithographic apparatus, device manufacturing method and device manufactured thereby'2009 7,448,763'Optical subassembly and projection objective in semiconductor lithography'2008 RE040043'Positioning device having two object holders'2008 7,289,212'Lithographic apparatus, device manufacturing method and device manufacturing thereby'2007 7,202,937'Balanced positioning system for use in lithographic apparatus'2007 7,081,945'Device manufacturing method, device manufactured thereby and lithographic apparatus therefor'2006 7,057,313'Cooling of voice coil motors'2006 7,034,920'Balanced positioning system for use in lithographic apparatus'2006 6,924,882'Balanced positioning system for use in lithographic apparatus'2005 6,852,989'Positioning system for use in lithographic apparatus'2005 6,819,425'Lithographic apparatus, device manufacturing method, and device manufactured thereby'2004 6,710,849'Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method'2004 6,671,036'Balanced positioning system for use in lithographic apparatus'2003 6,657,204'Cooling of voice coil motors in lithographic projection apparatus'2003 6,635,887'Positioning system for use in lithographic apparatus'2003 6,542,220'Purge gas systems for use in lithographic projection apparatus'2003 6,525,803'Balanced positioning system for use in lithographic apparatus'2003 6,509,951'Lithographic projection apparatus having a temperature controlled heat shield'2003 6,498,350'Crash prevention in positioning apparatus for use in lithographic projection apparatus'2002 6,449,030'Balanced positioning system for use lithographic apparatus'2002 6,296,990'Gas bearing and lithographic apparatus including such a bearing'2001 6,262,796'Positioning device having two object holders'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2007Based in Eindhoven, NL· patent location history

2002–2020Patents assigned to ASML NETHERLANDS BV (29)· patent assignee history

2003–2009Based in Munich, DE· patent location history

2006–2020Based in Aalen, DE· patent location history

2008–2018Patents assigned to ZEISS CARL SMT AG (9)· patent assignee history

2011–2020Patents assigned to ZEISS CARL SMT GMBH (48)· patent assignee history

2011–2016Patents assigned to KWAN YIM-BUN PATRICK (18)· patent assignee history

2012–2016Patents assigned to XALTER STEFAN (8)· patent assignee history

2018–2020Based in Oberkochen, DE· patent location history

2021Based in Bellevue, WA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ZEISS CARL SMT GMBH	48	2011–2020
ASML NETHERLANDS BV	29	2002–2020
KWAN YIM-BUN PATRICKself	18	2011–2016
ZEISS CARL SMT AG	9	2008–2018
XALTER STEFAN	8	2012–2016

Locations

Location	Patents	Span
Aalen, DE	58	2006–2020
Eindhoven, NL	11	2001–2007
Oberkochen, DE	5	2018–2020
Munich, DE	5	2003–2009
Bellevue, Washington, US	1	2021