Inventor
Ricarda Schoemer
Inventor
Zusmarshausen, DE
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%
G02BOptical elements, systems or apparatus18%
G21KHandling of particles or ionising radiation not otherwise provided for11%
B60QArrangement of signalling or lighting devices, the mounting or supporting thereof or circuits therefor, for vehicles in general5%
B82YSpecific uses or applications of nanostructures5%
F21SNon-portable lighting devices5%
F21YIndexing scheme associated with subclasses f21k, f21l, f21s and f21v, relating to the form or the kind of the light sources or of the colour of the light emitted5%
F21VFunctional features or details of lighting devices or systems thereof3%
G06FElectric digital data processing3%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light3%
PatentTitleYear
11,112,543Optical element having a coating for influencing heating radiation and optical arrangement202111,035,536Illumination device for emitting illumination light202110,591,825Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography202010,416,569Attenuation filter for projection lens, projection lens having attenuation filter for projection exposure apparatus, and projection exposure apparatus having projection lens201910,401,540Optical element having a coating for influencing heating radiation and optical arrangement201910,183,613Projection lamp for illumination201910,061,206Projection lens with wave front manipulator and related method and apparatus201810,048,592Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography201810,018,907Method of operating a microlithographic projection apparatus201810,001,631Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element20189,939,730Optical assembly20189,910,364'Projection exposure apparatus including at least one mirror'20189,829,800System correction from long timescales20179,709,770'Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus'20179,372,411'Projection objective of a microlithographic projection exposure apparatus'20169,348,234'Microlithographic apparatus'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2021Patents assigned to ZEISS CARL SMT GMBH (14)· patent assignee history
2016–2021Based in Zusmarshausen, DE· patent location history
2019–2021Patents assigned to OSRAM GMBH (2)· patent assignee history
2021Patents assigned to OSRAM BETEILIGUNGSVERWALTUNG GMBH (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 14 | 2016–2021 |
| OSRAM GMBH | 2 | 2019–2021 |
| OSRAM BETEILIGUNGSVERWALTUNG GMBH | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Zusmarshausen, DE | 16 | 2016–2021 |