Inventor
ARPAN PRAVIN MAHOROWALA
Inventor
US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
C23CCoating metallic material18%
H01LSemiconductor devices18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%
H01JElectric discharge tubes or discharge lamps12%
C23FNon-mechanical removal of metallic material from surface6%
H10DInorganic electric semiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
PatentTitleYear
12,372,872Extreme ultraviolet (EUV) lithography using an intervening layer or a multi-layer stack with varying mean free paths for secondary electron generation202512,051,589Tin oxide thin film spacers in semiconductor device manufacturing202411,869,770Selective deposition of etch-stop layer for enhanced patterning202411,784,047Tin oxide thin film spacers in semiconductor device manufacturing2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2025Patents assigned to LAM RES CORP (4)· patent assignee history
2023–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 4 | 2023–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 4 | 2023–2025 |