Inventor
Eswaranand VENKATASUBRAMANIAN
Inventor
US
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01LSemiconductor devices23%
C23CCoating metallic material21%
H01JElectric discharge tubes or discharge lamps14%
H10BElectronic memory devices6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
C01BNon-metallic elements2%
B05DProcesses for applying fluent materials to surfaces, in general1%
B82YSpecific uses or applications of nanostructures1%
PatentTitleYear
12,555,741Magnetic housing systems202612,550,651Selective etching of silicon-containing material relative to metal-doped boron films202612,534,797Vapor-phase precursor seeding for diamond film deposition202612,486,577Pulsed plasma (DC/RF) deposition of high quality C films for patterning202512,463,036High density carbon films for patterning applications202512,362,181Methods of forming thermally stable carbon film202512,327,733Methods to reduce UNCD film roughness202512,037,679Method of forming a diamond film202412,014,925Metal-doped carbon hardmasks202411,946,134In situ nucleation for nanocrystalline diamond film deposition202411,894,230Tribological properties of diamond films202411,842,897High density carbon films for patterning applications202311,784,042Carbon hard masks for patterning applications and methods related thereto202311,676,858High bias deposition of high quality gapfill202311,638,374Multicolor approach to DRAM STI active cut patterning202311,621,160Doped and undoped vanadium oxides for low-k spacer applications202311,603,591Pulsed plasma (DC/RF) deposition of high quality C films for patterning202311,594,416Tribological properties of diamond films202311,587,764Magnetic housing systems202311,560,626Substrate processing chamber202311,557,478In-situ high power implant to relieve stress of a thin film202311,557,466Tuneable uniformity control utilizing rotational magnetic housing202311,469,097Carbon hard masks for patterning applications and methods related thereto202211,430,655Low temperature high-quality dielectric films202211,335,690Multicolor approach to DRAM STI active cut patterning202211,332,376Diamond-like carbon film202211,270,905Modulating film properties by optimizing plasma coupling materials202211,158,507In-situ high power implant to relieve stress of a thin film2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to APPLIED MATERIALS INC (28)· patent assignee history
2021–2026Based in US· patent location history
2023–2026Patents assigned to NAT UNIV SINGAPORE (5)· patent assignee history
2024Based in IN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 28 | 2021–2026 |
| NAT UNIV SINGAPORE | 5 | 2023–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 27 | 2021–2026 |
| IN | 1 | 2024 |