Inventor
PURUSHOTTAM KUMAR
Inventor
US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
H01LSemiconductor devices23%
H01JElectric discharge tubes or discharge lamps16%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices1%
G05BControl or regulating systems in general1%
H05HPlasma technique1%
H10DInorganic electric semiconductor devices1%
PatentTitleYear
12,448,687Dynamic precursor dosing for atomic layer deposition202512,431,349In-situ control of film properties during atomic layer deposition202512,354,871Ultrathin atomic layer deposition film accuracy thickness control202512,322,619Dynamic process control in semiconductor manufacturing202512,288,685Modifying hydrophobicity of a wafer surface using an organosilicon precursor202512,125,705Method for providing doped silicon using a diffusion barrier layer202412,077,859Variable cycle and time RF activation method for film thickness matching in a multi-station deposition system202412,057,300Apparatus for cleaning plasma chambers202412,049,699Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching202412,020,923Low-k ALD gap-fill methods and material202411,970,772Dynamic precursor dosing for atomic layer deposition202411,913,113Method and apparatus for modulating film uniformity202411,670,503Method of atomic layer deposition202311,651,963Method of improving deposition induced CD imbalance using spatially selective ashing of carbon based film202311,646,198Ultrathin atomic layer deposition film accuracy thickness control202311,479,856Multi-cycle ALD process for film uniformity and thickness profile modulation202211,373,862Surface modified depth controlled deposition for plasma based deposition202211,322,416Controller for controlling core critical dimension variation using flash trim sequence202211,293,098Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching202211,255,017Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system202211,180,850Dynamic precursor dosing for atomic layer deposition2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to LAM RES CORP (21)· patent assignee history
2021–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 21 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 21 | 2021–2025 |