Inventor
Phillip Spaull
Inventor
Shiroyama, JP
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
6,925,731'Thin film forming apparatus cleaning method'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005Patents assigned to TOKYO ELECTRON LTD (1)· patent assignee history
2005Based in Shiroyama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 1 | 2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shiroyama, JP | 1 | 2005 |