Inventor
Hiroshi Moriuma
Inventor
Nara, JP
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices53%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%
C07CAcyclic or carbocyclic compounds7%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
C08LCompositions of macromolecular compounds3%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
PatentTitleYear
7,135,268'Amplification type positive resist composition'20066,951,706'Sulfonate and resist composition'20056,835,527'Chemical amplifying type positive resist composition'20046,815,140'Positive resist composition'20046,767,686'Chemically amplifying type positive resist composition'20046,743,885'Resin composition for intermediate layer of three-layer resist'20046,274,287'Positive resist compositions comprising a hydroxyphenyl ketone'20016,068,962'Positive resist composition'20005,849,457'Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and .gamma. -'19985,468,590'Positive resist composition'19955,451,484'Positive resist composition'19955,429,904'Positive resist composition'19955,424,167'Positive type quinonediazide resist composition containing alkali-soluble novolac resin and aromatic hydroxy compound additive'19955,407,780'Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde'19955,326,665'Positive type resist composition'19945,275,910'Positive radiation-sensitive resist composition'19945,188,920'Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2006Patents assigned to SUMITOMO CHEMICAL CO (17)· patent assignee history
1993–2004Based in Nara, JP· patent location history
2001–2006Based in Toyonaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMITOMO CHEMICAL CO | 17 | 1993–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nara, JP | 11 | 1993–2004 |
| Toyonaka, JP | 6 | 2001–2006 |