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Inventor

MICHAEL LEO NELSON

Inventor
US

Overview

2→
Patents
2022–2025
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
G01BMeasuring length, thickness or similar linear dimensions20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
12,399,000Systems and methods for measuring intensity in a lithographic alignment apparatus2025RE049066Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to ASML HOLDING NV (2)· patent assignee history
2022Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2022–2025Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML HOLDING NV22022–2025
ASML NETHERLANDS BV12022
Locations
LocationPatentsSpan
US22022–2025