LexDanaLexDanabeta
Inventor

Tomohiro Okumura

Inventor
Osaka, JP

Overview

110→
Patents
1993–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 110 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps34%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H05HPlasma technique10%
C23CCoating metallic material9%
H01LSemiconductor devices6%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation2%
C09KMaterials for miscellaneous applications, not provided for elsewhere2%
H10DInorganic electric semiconductor devices2%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution2%
B60KArrangement or mounting of propulsion units or of transmissions in vehicles1%
PatentTitleYear
10,804,122Substrate heating apparatus, substrate heating method and method of manufacturing electronic device202010,229,814Plasma processing apparatus201910,181,406Plasma processing apparatus, plasma processing method, and method for manufacturing electronic device201910,147,585Plasma processing apparatus201810,141,162Plasma processing apparatus, plasma processing method, and method for manufacturing electronic device201810,115,565Plasma processing apparatus and plasma processing method20189,978,593Plasma processing device, plasma processing method and manufacturing method of electronic device20189,885,115'Plasma treatment apparatus and plasma treatment method'20189,799,495'Plasma processing apparatus and plasma processing method'20179,741,538'Plasma processing apparatus, plasma processing method, and method for manufacturing electronic device'20179,691,593'Plasma processing device and plasma processing method'20179,673,062'Plasma processing method'20179,627,183'Plasma processing device, plasma processing method and method of manufacturing electronic devices'20179,601,330'Plasma processing device, and plasma processing method'20179,595,458'Plasma processing apparatus and method, and method of manufacturing electronic device'20179,583,313'Plasma processing apparatus and plasma processing method'20179,502,220'Plasma processing apparatus and plasma processing method'20169,343,269'Plasma processing apparatus'20169,209,043'Semiconductor manufacturing method and semiconductor manufacturing apparatus'20159,105,803'Polycrystalline-type solar cell panel and process for production thereof'20158,889,155'Gel composition for treating mycosis'20148,853,523'Solar cell module and manufacturing method of the same'20148,802,567'Plasma processing method'20148,772,067'Silicon substrate having textured surface, solar cell having same, and method for producing same'20148,709,926'Plasma doping method and plasma doping apparatus'20148,703,613'Plasma processing apparatus and plasma processing method'20148,652,953'Plasma doping method with gate shutter'20148,624,340'Plasma processing apparatus and method thereof'20148,511,290'EGR valve device'20138,450,819'Plasma doping method and apparatus thereof'20138,404,573'Plasma processing method and apparatus'20138,324,685'Semiconductor device having a fin-type semiconductor region'20128,288,259'Plasma processing method and apparatus'20128,264,146'Plasma display panel and method for producing the same'20128,257,501'Plasma doping device with gate shutter'20128,162,710'Method for producing plasma display panel with a bright display and a low operating voltage'20128,160,298'Display device'20128,129,202'Plasma doping method and apparatus'20128,113,899'Method for producing plasma display panel'20128,098,253'Display unit and method for displaying multiple images'20128,063,563'Plasma display panel and method for producing the same'20118,004,171'Dielectric layer containing carbon for a plasma display panel'20117,994,719'Plasma display panel with improved luminance'20117,939,388'Plasma doping method and plasma doping apparatus'20117,880,395'Method for restoring function of plasma display panel and plasma display panel'20117,863,168'Plasma doping method and plasma doping apparatus'20117,858,155'Plasma processing method and plasma processing apparatus'20107,858,479'Method and apparatus of fabricating semiconductor device'20107,858,537'Plasma processing method and apparatus'20107,821,387'Display unit and method for displaying image'20107,759,254'Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing device'20107,755,286'Glass film, process for production thereof, and optical electronic device'20107,722,423'Method of manufacturing plasma display panel with concave barrier wall portion'20107,690,961'Plasma display panel and process for producing the plasma display panel'20107,686,971'Plasma processing apparatus and method'20107,666,770'Method of controlling impurity doping and impurity doping apparatus'20107,626,184'Impurity introducing apparatus and impurity introducing method'20097,622,725'Impurity introducing apparatus and impurity introducing method'20097,604,849'Plasma processing method and apparatus'20097,601,619'Method and apparatus for plasma processing'20097,582,492'Method of doping impurities, and electronic element using the same'20097,575,987'Method of plasma doping'20097,513,214'Plasma processing method and apparatus'20097,510,667'Plasma processing method and apparatus'20097,501,762'Plasma display panel and process for producing the same'20097,465,407'Plasma processing method and apparatus'20087,456,085'Method for introducing impurities'20087,407,874'Plasma doping method'20087,406,925'Plasma processing method and apparatus'20087,358,511'Plasma doping method and plasma doping apparatus'20087,348,264'Plasma doping method'20087,331,306'Plasma processing method and apparatus'20087,329,989'Plasma display panel and process for producing the plasma display panel'20087,280,202'Ingredient analysis method and ingredient analysis apparatus'20077,232,591'Method of using an adhesive for temperature control during plasma processing'20077,199,064'Plasma processing method and apparatus'20077,192,854'Method of plasma doping'20077,176,402'Method and apparatus for processing electronic parts'20077,157,659'Plasma processing method and apparatus'20077,135,089'Method and apparatus for plasma processing'20067,056,416'Atmospheric pressure plasma processing method and apparatus'20067,022,937'Plasma processing method and apparatus for performing uniform plasma processing on a linear portion of an object'20067,022,615'Plasma processing method'20066,905,625'Plasma processing method and apparatus'20056,893,971'Dry etching method and apparatus'20056,875,307'Method and apparatus for plasma processing'20056,864,640'Plasma processing method and apparatus thereof'20056,830,653'Plasma processing method and apparatus'20046,808,759'Plasma processing method and apparatus'20046,707,253'Matching circuit and plasma processing apparatus'20046,630,792'High frequency power source, plasma processing apparatus, inspection method for plasma processing apparatus, and plasma processing method'20036,517,670'Etching and cleaning apparatus'20036,432,730'Plasma processing method and apparatus'20026,355,573'Plasma processing method and apparatus'20026,346,915'Plasma processing method and apparatus'20026,342,139'Sputtering system'20026,297,165'Etching and cleaning methods'20016,291,937'High frequency coupler, and plasma processing apparatus and method'20016,177,646'Method and device for plasma treatment'20016,093,457'Method for plasma processing'20006,030,667'Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma'20005,922,223'Plasma processing method and apparatus'19995,916,820'Thin film forming method and apparatus'19995,888,413'Plasma processing method and apparatus'19995,711,850'Plasma processing apparatus'19985,693,236'Water-repellent surface structure and its fabrication method'19975,609,690'Vacuum plasma processing apparatus and method'19975,558,722'Plasma processing apparatus'19965,372,648'Plasma CVD system'19945,265,850'Refractory for gas blowing for molten metal refining vessel'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2009Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (43)· patent assignee history
1996–1999Based in Neyagawa, JP· patent location history
1999–2014Based in Kadoma, JP· patent location history
2000–2020Based in Osaka, JP· patent location history
2008–2019Patents assigned to PANASONIC CORP (49)· patent assignee history
2010–2012Based in Kariya, JP· patent location history
2011–2015Patents assigned to OKUMURA TOMOHIRO (20)· patent assignee history
2012–2015Patents assigned to NAKAYAMA ICHIRO (11)· patent assignee history
2014Based in Fujieda, JP· patent location history
2015–2020Patents assigned to PANASONIC IP MAN CO LTD (20)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
PANASONIC CORP492008–2019
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD431994–2009
OKUMURA TOMOHIROself202011–2015
PANASONIC IP MAN CO LTD202015–2020
NAKAYAMA ICHIRO112012–2015
Locations
LocationPatentsSpan
Osaka, JP572000–2020
Kadoma, JP401999–2014
Neyagawa, JP61996–1999
Kariya, JP32010–2012
Fujieda, JP12014