Inventor
Ryuji Kimura
Inventor
Katsushika-ku, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Kprimary
H05KPrinted circuits17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
H01BCables11%
B22DCasting of metals6%
B24CAbrasive or related blasting with particulate material6%
B81BMicrostructural devices or systems, e.g. micromechanical devices6%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems6%
C07BGeneral methods of organic chemistry6%
C07CAcyclic or carbocyclic compounds6%
C10MLubricating compositions6%
PatentTitleYear
11,046,629Method of producing compound having butadiene skeleton containing hydrogen and fluorine and/or chlorine20219,067,303'Method of executing shot peening'20158,759,211'Electronic device, conductive composition, metal filling apparatus, and electronic device manufacturing method'20148,415,784'Electronic device, conductive composition, metal filling apparatus, and electronic device manufacturing method'20138,079,131'Method for filling metal into fine space'20114,427,561'Sulfur compound containing lubricant composition for use in Flon atmosphere'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984Based in Urawa, JP· patent location history
2011–2014Patents assigned to NAPRA CO LTD (3)· patent assignee history
2011–2013Patents assigned to KIMURA RYUJI (2)· patent assignee history
2011–2013Patents assigned to SEKINE SHIGENOBU (2)· patent assignee history
2011–2013Patents assigned to SEKINE YURINA (2)· patent assignee history
2011–2014Based in Katsushika-ku, JP· patent location history
2015Patents assigned to HITACHI GE NUCLEAR ENERGY LTD (1)· patent assignee history
2015Based in Hitachi, JP· patent location history
2021Based in Shibukawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NAPRA CO LTD | 3 | 2011–2014 |
| KIMURA RYUJIself | 2 | 2011–2013 |
| SEKINE SHIGENOBU | 2 | 2011–2013 |
| SEKINE YURINA | 2 | 2011–2013 |
| HITACHI GE NUCLEAR ENERGY LTD | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Katsushika-ku, JP | 3 | 2011–2014 |
| Shibukawa, JP | 1 | 2021 |
| Hitachi, JP | 1 | 2015 |
| Urawa, JP | 1 | 1984 |