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Inventor

Mika Tazuru

Inventor
Kyotanabe, JP

Overview

2→
Patents
2019–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing18%
C09GPolishing compositions18%
C09KMaterials for miscellaneous applications, not provided for elsewhere18%
H01LSemiconductor devices18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
PatentTitleYear
10,696,869Polishing composition202010,435,588Polishing composition2019

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019–2020Patents assigned to NITTA HAAS INC (2)· patent assignee history
2019–2020Based in Kyotanabe, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NITTA HAAS INC22019–2020
Locations
LocationPatentsSpan
Kyotanabe, JP22019–2020