Inventor
Naoko Matsuyama
Inventor
Tokyo, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
C23CCoating metallic material20%
C30BSingle-crystal growth20%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry10%
C07CAcyclic or carbocyclic compounds10%
PatentTitleYear
6,555,421'Method and apparatus for manufacturing semiconductor device'20036,472,639'Heat treatment method and heat treatment apparatus'20026,414,280'Heat treatment method and heat treatment apparatus'20026,204,199'Method for producing a semiconductor device'20015,239,108'Process for producing aliphatic or alicyclic aldehyde'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993Patents assigned to MITSUBISHI CHEM IND (1)· patent assignee history
1993Based in Kanagawa, JP· patent location history
2001–2003Patents assigned to HITACHI INT ELECTRIC INC (2)· patent assignee history
2001–2003Based in Tokyo, JP· patent location history
2002Patents assigned to KOKUSAI ELECTRIC CO LTD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 2 | 2001–2003 |
| KOKUSAI ELECTRIC CO LTD | 2 | 2002 |
| MITSUBISHI CHEM IND | 1 | 1993 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 4 | 2001–2003 |
| Kanagawa, JP | 1 | 1993 |