Inventor
Hideki Ishikawa
Inventor
Aichi, JP
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy20%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution20%
G11BInformation storage based on relative movement between record carrier and transducer10%
Y02PClimate change mitigation technologies in the production or processing of goods4%
A61BDiagnosis2%
C01BNon-metallic elements2%
C01GCompounds containing metals not covered by subclasses c01d or c01f2%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds2%
F02DControlling combustion engines2%
PatentTitleYear
10,665,872Fuel cell stack and method for manufacturing fuel cell stack202010,637,075Fuel cell stack and method for manufacturing fuel cell stack202010,224,555Fuel cell201910,224,553Fuel cell comprising connection members having different thickness for each of cell units and method for manufacturing same20199,761,888'Fuel cell'20179,131,985'Medical treatment device'20158,416,654'Optical disc drive apparatus, optical pickup control method and program'20138,130,605'Driving device and method, program, and recording medium'20127,492,075'Multilayer piezoelectric element, fuel injector having the piezoelectric element and piezoelectric element production method'20097,416,651'Gas sensor'20087,272,084'Optical disc apparatus and tracking control method'20077,082,810'Gas sensor'20067,080,543'Sensor and method for manufacturing the same'20066,892,565'Gas sensor and gas concentration detecting device'20056,892,566'Gas concentration sensor'20056,886,412'Ultrasonic-wave propagation-time measuring method and gas concentration sensor'20056,568,240'Method and apparatus using a gas concentration sensor for accurately controlling an air fuel ratio in an internal combustion engine'20036,568,281'Ultrasonic-wave propagation-time measuring method, gas-pressure measuring method, gas-flow rate measuring method, and gas sensor'20036,418,782'Gas concentration sensor'20026,308,572'Gas concentration sensor'20016,031,801'Apparatus and method for reproducing data recorded at a predetermined linear velocity on a disc-like recording medium'20005,796,696'Chassis with strengthening rib having stepped section for recording and/or reproducing apparatus'1998RE035818'Non-aqueous electrolyte secondary battery and method of producing the same'19985,620,812'Non-aqueous electrolyte secondary battery'19975,506,075'Non-aqueous electrolyte secondary battery and method of producing the same'19965,401,599'Non-aqueous electrolyte secondary battery and method of producing the same'19955,395,711'Non-aqueous electrolyte secondary battery and its production method'19955,286,582'Monaqueous electrolyte secondary battery and process for producing positive active materials'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–1996Patents assigned to SEIKO ELECTRONIC COMPONENTS (4)· patent assignee history
1994–1998Based in Sendai, JP· patent location history
1995–1998Patents assigned to SEIKO INSTR INC (5)· patent assignee history
1998–2007Based in Tokyo, JP· patent location history
2000–2013Patents assigned to SONY CORP (4)· patent assignee history
2000–2013Based in Kanagawa, JP· patent location history
2001–2020Patents assigned to NGK SPARK PLUG CO (15)· patent assignee history
2001–2009Based in Aichi, JP· patent location history
2012–2015Patents assigned to ISHIKAWA HIDEKI (3)· patent assignee history
2017–2020Based in Ichinomiya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NGK SPARK PLUG CO | 15 | 2001–2020 |
| SEIKO INSTR INC | 5 | 1995–1998 |
| SEIKO ELECTRONIC COMPONENTS | 4 | 1994–1996 |
| SONY CORP | 4 | 2000–2013 |
| ISHIKAWA HIDEKIself | 3 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aichi, JP | 11 | 2001–2009 |
| Ichinomiya, JP | 5 | 2017–2020 |
| Sendai, JP | 5 | 1994–1998 |
| Kanagawa, JP | 3 | 2000–2013 |
| Tokyo, JP | 2 | 1998–2007 |