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Inventor

Rudolf Rhein

Inventor
Heppenheim, DE

Overview

4→
Patents
2002–2009
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C09KMaterials for miscellaneous applications, not provided for elsewhere14%
C11DDetergent compositions14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
C09GPolishing compositions7%
C23FNon-mechanical removal of metallic material from surface7%
PatentTitleYear
7,531,492'Composition for the removal of sidewall residues'20097,501,072'Etching solution comprising hydrofluoric acid'20097,417,016'Composition for the removing of sidewall residues'20086,338,743'Buffer solutions for suspensions used in chemical-mechanical polishing'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002Patents assigned to MERCK PATENT GMBH (1)· patent assignee history
2002–2009Based in Heppenheim, DE· patent location history
2008–2009Patents assigned to BASF SE (2)· patent assignee history
2009Patents assigned to BASF AG (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
BASF SE22008–2009
BASF AG12009
MERCK PATENT GMBH12002
Locations
LocationPatentsSpan
Heppenheim, DE42002–2009