Inventor
TADASHI IINO
Inventor
JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H01LSemiconductor devices20%
B05BSpraying apparatus13%
B08BCleaning in general13%
G01NInvestigating or analysing materials by determining their chemical or physical properties13%
B01DSeparation7%
PatentTitleYear
12,275,030Substrate processing apparatus and method for determining deterioration degree of conductive pipe202512,036,585Substrate processing apparatus202411,938,500Substrate processing apparatus and method for determining deterioration degree of conductive pipe202411,574,827Substrate processing apparatus and substrate processing method202311,488,849Substrate processing apparatus with resistance value varying mechanism2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TOKYO ELECTRON LTD (5)· patent assignee history
2022–2025Based in JP· patent location history
2025Patents assigned to TOKYO ELECTRONIC LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 5 | 2022–2025 |
| TOKYO ELECTRONIC LTD | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 5 | 2022–2025 |