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Inventor

SHOU SHIMIZU

Inventor
JP

Overview

2→
Patents
2024–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds29%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H01LSemiconductor devices14%
PatentTitleYear
12,510,823Resist underlayer film-forming composition containing alicyclic compound-terminated polymer202512,072,631Resist underlayer film-forming composition and method for forming resist pattern using the same2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2025Patents assigned to NISSAN CHEMICAL CORP (2)· patent assignee history
2024–2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NISSAN CHEMICAL CORP22024–2025
Locations
LocationPatentsSpan
JP22024–2025