Inventor
ANTOINE GASTON MARIE KIERS
Inventor
NL
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
G06TImage data processing or generation, in general19%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
G06FElectric digital data processing10%
G06NComputing arrangements based on specific computational models10%
G06VImage or video recognition or understanding10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
G06KGraphical data reading5%
H01JElectric discharge tubes or discharge lamps5%
PatentTitleYear
12,315,175Method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the method202511,966,168Method of measuring variation, inspection system, computer program, and computer system202411,847,570Deep learning for semantic segmentation of pattern202311,525,786Method and apparatus for angular-resolved spectroscopic lithography characterization202211,379,970Deep learning for semantic segmentation of pattern2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2022–2025Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 5 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 5 | 2022–2025 |