Inventor
Kevin Peterlinz
Inventor
Fremont, CA, US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions22%
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
H01LSemiconductor devices9%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%
G06FElectric digital data processing4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
G16ZInformation and communication technology [ict] specially adapted for specific application fields, not otherwise provided for1%
PatentTitleYear
11,119,050Methods and systems for measurement of thick films and high aspect ratio structures202110,969,328Optical metrology tool equipped with modulated illumination sources202110,690,602Methods and systems for measurement of thick films and high aspect ratio structures202010,648,796Optical metrology with small illumination spot size202010,612,916Measurement of multiple patterning parameters202010,438,825Spectral reflectometry for in-situ process monitoring and control201910,234,271Method and system for spectroscopic beam profile metrology including a detection of collected light according to wavelength along a third dimension of a hyperspectral detector201910,215,688Optical metrology tool equipped with modulated illumination sources201910,101,676Spectroscopic beam profile overlay metrology201810,072,921Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element20189,915,524'Optical metrology with small illumination spot size'20189,816,810'Measurement of multiple patterning parameters'20179,778,213'Metrology tool with combined XRF and SAXS capabilities'20179,574,992'Single wavelength ellipsometry with improved spot size capability'20179,535,018'Combined x-ray and optical metrology'20179,490,182'Measurement of multiple patterning parameters'20169,400,246'Optical metrology tool equipped with modulated illumination sources'20169,291,554'Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspection'20169,243,886'Optical metrology of periodic targets in presence of multiple diffraction orders'20169,228,943'Dynamically adjustable semiconductor metrology system'20168,982,358'Apparatus and method of measuring roughness and other parameters of a structure'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2021Patents assigned to KLA TENCOR CORP (20)· patent assignee history
2015–2021Based in Fremont, CA, US· patent location history
2016Patents assigned to KUZNETSOV ALEXANDER (1)· patent assignee history
2016Patents assigned to LIU XUEFENG (1)· patent assignee history
2017–2021Based in San Ramon, CA, US· patent location history
2018Patents assigned to KLA—TENCOR CORP (1)· patent assignee history
2021Patents assigned to KLA CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 20 | 2015–2021 |
| KLA CORP | 2 | 2021 |
| KLA—TENCOR CORP | 1 | 2018 |
| KUZNETSOV ALEXANDER | 1 | 2016 |
| LIU XUEFENG | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fremont, California, US | 13 | 2015–2021 |
| San Ramon, California, US | 8 | 2017–2021 |