Inventor
Wei-Yao Hsu
Inventor
Hsinchu, TW
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus43%
F16MFrames, casings or beds of engines, machines or apparatus, not specific to engines, machines or apparatus provided for elsewhere14%
G01BMeasuring length, thickness or similar linear dimensions14%
G01MTesting static or dynamic balance of machines or structures14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
PatentTitleYear
10,768,414Lens device for compensating aberration in the optical system and the adjustment method thereof202010,260,988Non-contact measurement device for radius of curvature and thickness of lens and measurement method thereof201910,216,094Support device and method for supporting lens and support component for supporting functional element20197,851,735'Microscope automatic focusing device and method thereof'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010Patents assigned to TECHNOLOGY RES CT NAT APPLIED RES LAB (1)· patent assignee history
2010–2020Based in Hsinchu, TW· patent location history
2019–2020Patents assigned to NAT APPLIED RES LABORATORIES (3)· patent assignee history
2019Based in Taipei, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NAT APPLIED RES LABORATORIES | 3 | 2019–2020 |
| TECHNOLOGY RES CT NAT APPLIED RES LAB | 1 | 2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 3 | 2010–2020 |
| Taipei, TW | 1 | 2019 |