Inventor

Lon Wang

Inventor
Taipei, TW

Overview

10→
Patents
2000–2016
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light14%
A61BDiagnosis7%
B29CShaping or joining of plastics7%
B29DProducing particular articles from plastics or from substances in a plastic state7%
B82YSpecific uses or applications of nanostructures7%
G02BOptical elements, systems or apparatus7%
H04BTransmission7%
H04JMultiplex communication7%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2013Patents assigned to IND TECH RES INST (4)· patent assignee history
2000–2016Based in Taipei, TW· patent location history
2012–2014Patents assigned to WANG LON (5)· patent assignee history
2012–2016Patents assigned to UNIV NAT TAIWAN (4)· patent assignee history
2012–2013Patents assigned to CHANG JER-HAUR (3)· patent assignee history
2012–2013Patents assigned to CHEN YUNG-PIN (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
WANG LONself52012–2014
IND TECH RES INST42000–2013
UNIV NAT TAIWAN42012–2016
CHANG JER-HAUR32012–2013
CHEN YUNG-PIN32012–2013
Locations
LocationPatentsSpan
Taipei, TW102000–2016