Inventor
Toshihiko Ishihara
Inventor
San Diego, CA, US
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Sprimary
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light30%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light6%
G02BOptical elements, systems or apparatus6%
C23CCoating metallic material4%
D06PDyeing or printing textiles4%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy4%
H03KPulse technique4%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
PatentTitleYear
11,075,420Coin-type battery and manufacturing method thereof202110,982,966Generation of route network data for movement202110,933,010External dermal agent20218,679,672'Flat battery'2014RE042588'Control system for a two chamber gas discharge laser system'20117,894,494'Method and apparatus to control output spectrum bandwidth of MOPO or MOPA laser'20117,741,639'Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control'20107,596,164'Control system for a two chamber gas discharge laser'20097,079,564'Control system for a two chamber gas discharge laser'20067,039,086'Control system for a two chamber gas discharge laser'20066,963,595'Automatic gas control system for a gas discharge laser'20056,690,704'Control system for a two chamber gas discharge laser'2004RE038054'Reliable, modular, production quality narrow-band high rep rate F2 laser'20036,352,563'Printed cloth and method of manufacturing the same'20026,330,261'Reliable, modular, production quality narrow-band high rep rate ArF excimer laser'20016,188,710'Narrow band gas discharge laser with gas additive'20016,051,036'Printed cloth and method of manufacturing the same'20006,034,978'Gas discharge laser with gas temperature control'20006,018,537'Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser'20006,014,397'Laser chamber incorporating ceramic insulators coated with dielectric material'20006,014,398'Narrow band excimer laser with gas additive'20005,982,800'Narrow band excimer laser'19995,345,863'Continuous web printing apparatus'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2002Patents assigned to KANEBO LTD (3)· patent assignee history
1994–2002Based in Sanda, JP· patent location history
1999–2011Patents assigned to CYMER INC (16)· patent assignee history
1999–2011Based in San Diego, CA, US· patent location history
2014Patents assigned to HITACHI MAXELL (1)· patent assignee history
2021Patents assigned to HAYASHIBARA CO (1)· patent assignee history
2021Patents assigned to IBM (1)· patent assignee history
2021Based in Kyoto, JP· patent location history
2021Based in Tokyo, JP· patent location history
2021Based in Okayama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CYMER INC | 16 | 1999–2011 |
| KANEBO LTD | 3 | 1994–2002 |
| HAYASHIBARA CO | 1 | 2021 |
| HITACHI MAXELL | 1 | 2014 |
| IBM | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Diego, California, US | 16 | 1999–2011 |
| Sanda, JP | 3 | 1994–2002 |
| Kyoto, JP | 1 | 2021 |
| Tokyo, JP | 1 | 2021 |
| Okayama, JP | 1 | 2021 |