Inventor
Jan Frederik Hoogkamp
Inventor
Breda, NL
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
E06BFixed or movable closures for openings in buildings, vehicles, fences or like enclosures in general, e.g. doors, windows, blinds, gates6%
A41BShirts3%
A41CCorsets3%
B25JManipulators3%
F24FAir-conditioning3%
H01JElectric discharge tubes or discharge lamps3%
H02NElectric machines not otherwise provided for3%
PatentTitleYear
9,500,953'Radiation source'20167,878,755'Load lock and method for transferring objects'20117,576,831'Method and apparatus for maintaining a machine part'20097,486,384'Lithographic support structure'20097,459,701'Stage apparatus, lithographic apparatus and device manufacturing method'20087,408,615'Lithographic apparatus and device manufacturing method'20087,394,520'Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock'20087,394,525'Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing method'20087,359,031'Lithographic projection assembly, load lock and method for transferring objects'20087,349,067'Lithographic apparatus and device manufacturing method'20087,345,736'Lithographic apparatus and device manufacturing method'20087,131,999'Lithographic apparatus and device manufacturing method'20067,123,349'Lithographic projection assembly, substrate handling apparatus and substrate handling method'20067,106,420'Lithographic apparatus and device manufacturing method'20066,498,350'Crash prevention in positioning apparatus for use in lithographic projection apparatus'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2016Patents assigned to ASML NETHERLANDS BV (15)· patent assignee history
2002Based in Veldhoven, NL· patent location history
2006–2016Based in Breda, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 15 | 2002–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Breda, NL | 14 | 2006–2016 |
| Veldhoven, NL | 1 | 2002 |