Inventor

Mike Ravkin

Inventor

Sunnyvale, CA, US

Overview

2001–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 51 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests19%

B08BCleaning in general15%

C25DProcesses for the electrolytic or electrophoretic production of coatings6%

Y10TTechnical subjects covered by former us classification5%

B24BMachines, devices, or processes for grinding or polishing4%

C11DDetergent compositions4%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%

B05DProcesses for applying fluent materials to surfaces, in general3%

C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis2%

PatentTitleYear

10,720,343Method and apparatus for processing wafer-shaped articles2020 10,679,871Method and apparatus for processing wafer-shaped articles2020 8,997,684'Prevention of particle adders when contacting a liquid meniscus over a substrate'2015 8,671,959'Method and apparatus for cleaning a substrate using non-newtonian fluids'2014 8,623,152'Reduction of entrance and exit marks left by a substrate-processing meniscus'2014 8,590,550'Apparatus for cleaning contaminants from substrate'2013 8,535,451'Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids'2013 8,534,303'Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus'2013 8,317,932'Reduction of entrance and exit marks left by a substrate-processing meniscus'2012 8,313,580'Method for processing a substrate using a single phase proximity head having a controlled meniscus'2012 8,242,067'Two-phase substrate cleaning material'2012 8,105,441'Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus'2012 8,043,441'Method and apparatus for cleaning a substrate using non-Newtonian fluids'2011 7,997,288'Single phase proximity head having a controlled meniscus for treating a substrate'2011 7,946,303'Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus'2011 7,947,157'Apparatus and method for depositing and planarizing thin films of semiconductor wafers'2011 7,939,139'Methods for atomic layer deposition (ALD) using a proximity meniscus'2011 7,897,213'Methods for contained chemical surface treatment'2011 7,799,141'Method and system for using a two-phases substrate cleaning compound'2010 7,780,825'Substrate gripper with integrated electrical contacts'2010 7,703,462'Reduction of entrance and exit marks left by a substrate-processing meniscus'2010 7,632,376'Method and apparatus for atomic layer deposition (ALD) in a proximity system'2009 7,614,411'Controls of ambient environment during wafer drying using proximity head'2009 7,591,613'Method and apparatus for transporting a substrate using non-newtonian fluid'2009 7,568,490'Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids'2009 7,464,719'Multi-menisci processing apparatus'2008 7,416,370'Method and apparatus for transporting a substrate using non-Newtonian fluid'2008 7,387,689'Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces'2008 7,350,315'Edge wheel dry manifold'2008 7,264,007'Method and apparatus for cleaning a substrate using megasonic power'2007 7,234,477'Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces'2007 7,153,400'Apparatus and method for depositing and planarizing thin films of semiconductor wafers'2006 7,069,937'Vertical proximity processor'2006 7,029,369'End-point detection apparatus'2006 6,858,091'Method for controlling galvanic corrosion effects on a single-wafer cleaning system'2005 6,827,793'Drip manifold for uniform chemical delivery'2004 6,726,530'End-point detection system for chemical mechanical polishing applications'2004 6,711,775'System for cleaning a semiconductor wafer'2004 6,679,763'Apparatus and method for qualifying a chemical mechanical planarization process'2004 6,622,335'Drip manifold for uniform chemical delivery'2003 6,616,772'Methods for wafer proximity cleaning and drying'2003 6,611,326'System and apparatus for evaluating the effectiveness of wafer drying operations'2003 6,594,847'Single wafer residue, thin film removal and clean'2003 6,543,084'Wafer scrubbing brush core'2003 6,537,381'Method for cleaning and treating a semiconductor wafer after chemical mechanical polishing'2003 6,521,050'Methods for evaluating advanced wafer drying techniques'2003 6,488,040'Capillary proximity heads for single wafer cleaning and drying'2002 6,435,952'Apparatus and method for qualifying a chemical mechanical planarization process'2002 6,375,540'End-point detection system for chemical mechanical posing applications'2002 6,361,414'Apparatus and method for conditioning a fixed abrasive polishing pad in a chemical mechanical planarization process'2002 6,240,588'Wafer scrubbing brush core'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2015Patents assigned to LAM RES CORP (49)· patent assignee history

2001–2014Based in Sunnyvale, CA, US· patent location history

2009–2013Based in Santa Clara, CA, US· patent location history

2012–2015Patents assigned to RAVKIN MIKE (10)· patent assignee history

2012–2014Patents assigned to DE LARIOS JOHN M (4)· patent assignee history

2012–2014Patents assigned to KOROLIK MIKHAIL (4)· patent assignee history

2012–2014Patents assigned to O'DONNELL ROBERT (4)· patent assignee history

2014Based in Sunnyyale, CA, US· patent location history

2015–2020Based in Los Altos, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
LAM RES CORP	49	2001–2015
RAVKIN MIKEself	10	2012–2015
DE LARIOS JOHN M	4	2012–2014
KOROLIK MIKHAIL	4	2012–2014
O'DONNELL ROBERT	4	2012–2014

Locations

Location	Patents	Span
Sunnyvale, California, US	45	2001–2014
Los Altos, California, US	3	2015–2020
Santa Clara, California, US	2	2009–2013
Sunnyyale, California, US	1	2014