Inventor
Tae Wook Seo
Inventor
Suwon-si, KR
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1027%
C23CCoating metallic material17%
H10DInorganic electric semiconductor devices13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H10BElectronic memory devices3%
PatentTitleYear
8,029,859'Method of depositing Ge-Sb-Te thin film'20117,842,606'Method of depositing thin film and method of manufacturing semiconductor using the same'20107,785,664'Method of depositing thin film'20107,638,437'In-situ thin-film deposition method'20097,253,101'Deposition method of TiN thin film having a multi-layer structure'20076,569,782'Insulating layer, semiconductor device and methods for fabricating the same'20036,387,776'Method for forming trench isolation regions'20026,376,303'Method of manufacturing a capacitor having oxide layers with different impurities and method of fabricating a semiconductor device comprising the same'20026,372,555'Semiconductor integrated circuit device and method of manufacturing the same'20026,329,276'Method of forming self-aligned silicide in semiconductor device'20016,291,342'Methods of forming titanium nitride composite layers using composite gases having increasing TiCl4 to NH3 ratios'20016,207,557'Method of forming multilayer titanium nitride film by multiple step chemical vapor deposition process and method of manufacturing semiconductor device using the same'20015,326,709'Wafer testing process of a semiconductor device comprising a redundancy circuit'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2003Patents assigned to SAMSUNG ELECTRONICS CO LTD (7)· patent assignee history
1994–2007Based in Kyungki-do, KR· patent location history
2001Patents assigned to SAMSUNG ELECTRONICS CO INC (1)· patent assignee history
2001–2010Based in Suwon-si, KR· patent location history
2003Based in Gyeonggi-do, KR· patent location history
2007–2010Patents assigned to IPS LTD (3)· patent assignee history
2009Based in Pyungtaek, KR· patent location history
2010–2011Patents assigned to INTEGRATED PROCESS SYSTEMS LTD (2)· patent assignee history
2011Based in Yongin-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 7 | 1994–2003 |
| IPS LTD | 3 | 2007–2010 |
| INTEGRATED PROCESS SYSTEMS LTD | 2 | 2010–2011 |
| SAMSUNG ELECTRONICS CO INC | 1 | 2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwon-si, KR | 5 | 2001–2010 |
| Kyungki-do, KR | 5 | 1994–2007 |
| Yongin-si, KR | 1 | 2011 |
| Pyungtaek, KR | 1 | 2009 |
| Gyeonggi-do, KR | 1 | 2003 |