Inventor
Akihiko Yoshikawa
Inventor
Chiba, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus17%
H01LSemiconductor devices11%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation9%
H10HInorganic light-emitting semiconductor devices having potential barriers9%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution9%
Y02PClimate change mitigation technologies in the production or processing of goods9%
B82YSpecific uses or applications of nanostructures6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
C23CCoating metallic material3%
PatentTitleYear
10,937,928Nitride semiconductor element, nitride semiconductor light emitting element, ultraviolet light emitting element20219,530,920'Photoelectric conversion device'20169,509,124'Photoelectric conversion device and characteristic inspection method for same'20169,444,000'Photoelectric conversion device'20168,699,129'Microscope system, storage medium storing control program, and control method'20148,280,142'Predetermined site luminescence measuring method, predetermined site luminescence measuring apparatus, expression amount measuring method, and measuring apparatus'20128,268,075'Method of producing zinc oxide semiconductor crystal'20128,194,313'Microscope and lamphouse'20127,986,824'Predetermined site luminescence measuring method, predetermined site luminescence measuring apparatus, expression amount measuring method, and measuring apparatus'20117,945,108'Microscope apparatus control method and microscope apparatus'20117,825,360'Optical apparatus provided with correction collar for aberration correction and imaging method using same'20106,856,005'Semiconductor device having a nitride-based hetero-structure and method of manufacturing the same'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2016Based in Chiba, JP· patent location history
2010–2014Patents assigned to OLYMPUS CORP (6)· patent assignee history
2010–2021Based in Tokyo, JP· patent location history
2011–2012Based in Hachioji, JP· patent location history
2012–2016Patents assigned to YOSHIKAWA AKIHIKO (7)· patent assignee history
2016Patents assigned to ISHITANI YOSHIHIRO (3)· patent assignee history
2016Patents assigned to KUSAKABE KAZUHIDE (3)· patent assignee history
2016Patents assigned to NAT UNIV CORP CHIBA UNIV (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| YOSHIKAWA AKIHIKOself | 7 | 2012–2016 |
| OLYMPUS CORP | 6 | 2010–2014 |
| ISHITANI YOSHIHIRO | 3 | 2016 |
| KUSAKABE KAZUHIDE | 3 | 2016 |
| NAT UNIV CORP CHIBA UNIV | 3 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chiba, JP | 5 | 2005–2016 |
| Tokyo, JP | 4 | 2010–2021 |
| Hachioji, JP | 3 | 2011–2012 |