Inventor
Vladimir Ivanovich Kuznetsov
Inventor
Delft, NL
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
C23CCoating metallic material17%
C30BSingle-crystal growth8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
H01LSemiconductor devices6%
H10DInorganic electric semiconductor devices4%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors2%
C03BManufacture, shaping, or supplementary processes2%
G01KMeasuring temperature2%
PatentTitleYear
10,837,107Method and apparatus for contactlessly advancing substrates20209,822,447'Dynamic fluid valve and method for establishing the same'20179,478,449'Floating substrate monitoring and control device, and method for the same'20168,118,941'Semiconductor processing parts having apertures with deposited coatings and methods for forming the same'20128,034,410'Protective inserts to line holes in parts for semiconductor process equipment'20118,002,463'Method and device for determining the temperature of a substrate'20117,807,222'Semiconductor processing parts having apertures with deposited coatings and methods for forming the same'20107,691,750'Methods of forming films in semiconductor devices with solid state reactants'20107,651,873'Method relating to the accurate positioning of a semiconductor wafer'20107,427,329'Temperature control for single substrate semiconductor processing reactor'20087,410,355'Method for the heat treatment of substrates'20087,351,293'Method and device for rotating a wafer'20087,153,772'Methods of forming silicide films in semiconductor devices'20067,048,488'Apparatus for transferring wafer and ring'20067,022,627'Method for the heat treatment of substrates'20066,964,751'Method and device for heat treating substrates'20056,877,250'Apparatus, method and system for the treatment of a wafer'20056,843,201'Temperature control for single substrate semiconductor processing reactor'20056,824,619'Method and device for rotating a wafer'20046,770,851'Method and apparatus for the treatment of substrates'20046,746,237'Method and device for heat treating substrates'20046,719,499'Device for positioning a wafer'20046,561,798'Apparatus for processing a wafer'20036,560,896'Apparatus, method and system for the treatment of a wafer'20036,551,404'Apparatus for treating a wafer'20036,329,304'Floating wafer reactor and method for the regulation of the temperature thereof'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2008Based in Delft, NL· patent location history
2003–2012Patents assigned to ASM INT (21)· patent assignee history
2004–2008Patents assigned to KONINKL PHILIPS ELECTRONICS NV (3)· patent assignee history
2004–2020Based in Utrecht, NL· patent location history
2005–2010Based in Ultrecht, NL· patent location history
2010–2011Based in JJ Utrecht, NL· patent location history
2012–2020Patents assigned to KUZNETSOV VLADIMIR (3)· patent assignee history
2016–2020Patents assigned to ASM INT NV (3)· patent assignee history
2016–2020Patents assigned to GRANNEMAN ERNST HENDRIK AUGUST (2)· patent assignee history
2016Based in Almere, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM INT | 21 | 2003–2012 |
| ASM INT NV | 3 | 2016–2020 |
| KONINKL PHILIPS ELECTRONICS NV | 3 | 2004–2008 |
| KUZNETSOV VLADIMIRself | 3 | 2012–2020 |
| GRANNEMAN ERNST HENDRIK AUGUST | 2 | 2016–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Delft, NL | 10 | 2001–2008 |
| Utrecht, NL | 7 | 2004–2020 |
| Ultrecht, NL | 6 | 2005–2010 |
| JJ Utrecht, NL | 2 | 2010–2011 |
| Almere, NL | 1 | 2016 |