Inventor
Chikako HANZAWA
Inventor
JP
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
12,124,164Reflective mask blank and reflective mask2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024Patents assigned to AGC INC (1)· patent assignee history
2024Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGC INC | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 1 | 2024 |