Inventor

Hakki Ergün Cekli

Inventor

Singapore, SG

Overview

2017–2021

Patent span

Physics

Primary field (CPC G)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices85%

G01BMeasuring length, thickness or similar linear dimensions5%

G01NInvestigating or analysing materials by determining their chemical or physical properties5%

G05BControl or regulating systems in general5%

PatentTitleYear

11,099,485Maintaining a set of process fingerprints2021 11,086,229Method to predict yield of a device manufacturing process2021 11,036,148Patterning device cooling system and method of thermally conditioning a patterning device2021 11,036,146Method and apparatus to reduce effects of nonlinear behavior2021 11,029,610Lithographic method2021 10,962,887Lithographic method2021 10,877,381Methods of determining corrections for a patterning process2020 10,642,166Patterning device cooling apparatus2020 10,578,980Method of determining a position of a feature2020 10,545,410Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product2020 10,527,958Lithographic method2020 10,495,986Patterning device cooling system and method of thermally conditioning a patterning device2019 10,474,045Lithographic apparatus and device manufacturing method2019 10,394,139Patterning device cooling apparatus2019 10,025,193Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product2018 9,879,988'Metrology method and apparatus, computer program and lithographic system'2018 9,753,377'Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017–2021Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history

2017–2021Based in Eindhoven, NL· patent location history

2019–2020Patents assigned to ASML HOLDING NV (2)· patent assignee history

2019–2021Based in Singapore, SG· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	17	2017–2021
ASML HOLDING NV	2	2019–2020

Locations

Location	Patents	Span
Singapore, SG	10	2019–2021
Eindhoven, NL	7	2017–2021