Inventor
FRANCISCUS GODEFRIDUS CASPER BIJNEN
Inventor
NL
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
G01BMeasuring length, thickness or similar linear dimensions8%
G06FElectric digital data processing8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
PatentTitleYear
12,242,203Target for measuring a parameter of a lithographic process202512,032,305Alignment method and associated alignment and lithographic apparatuses202411,966,166Measurement apparatus and a method for determining a substrate grid202411,927,892Alignment method and associated alignment and lithographic apparatuses202411,874,103Measurement apparatus202411,803,130Phase modulators in alignment to decrease mark size202311,531,280Compact alignment sensor arrangements202211,442,372Method of measuring an alignment mark or an alignment mark assembly, alignment system, and lithographic tool202211,181,836Method for determining deformation2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASML NETHERLANDS BV (9)· patent assignee history
2021–2025Based in NL· patent location history
2022–2023Patents assigned to ASML HOLDING NV (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 9 | 2021–2025 |
| ASML HOLDING NV | 2 | 2022–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 9 | 2021–2025 |