Inventor
Georg Soumagne
Inventor
Hiratsuka, JP
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Gprimary
H05GX-ray technique36%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%
G21KHandling of particles or ionising radiation not otherwise provided for21%
B82YSpecific uses or applications of nanostructures8%
G02BOptical elements, systems or apparatus8%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light3%
PatentTitleYear
10,455,679Extreme ultraviolet light generation device201910,136,510Extreme ultraviolet light generation device20189,661,730'Extreme ultraviolet light generation apparatus with a gas supply toward a trajectory of a target'20178,592,787'Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device'20138,586,953'Extreme ultra violet light source device'20138,513,630'Extreme ultraviolet light source apparatus'20138,507,885'Semiconductor exposure device using extreme ultra violet radiation'20138,492,738'Apparatus for and method of withdrawing ions in EUV light production apparatus'20138,354,657'Extreme ultra violet light source apparatus'20138,288,743'Apparatus for and method of withdrawing ions in EUV light production apparatus'20128,227,778'Semiconductor exposure device using extreme ultra violet radiation'20128,198,613'Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device'20128,143,606'Extreme ultra violet light source device'20128,067,756'Extreme ultraviolet light source apparatus'20117,928,418'Extreme ultra violet light source apparatus'20117,915,600'Extreme ultra violet light source apparatus'20117,006,309'Prism unit and laser device'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2019Patents assigned to GIGAPHOTON INC (16)· patent assignee history
2006Based in Oiso, JP· patent location history
2011–2013Patents assigned to SOUMAGNE GEORG (11)· patent assignee history
2011–2013Patents assigned to UENO YOSHIFUMI (7)· patent assignee history
2011–2013Patents assigned to ENDO AKIRA (4)· patent assignee history
2011–2013Based in Hiratsuka, JP· patent location history
2011–2013Based in Kamakura, JP· patent location history
2012–2013Patents assigned to WAKABAYASHI OSAMU (6)· patent assignee history
2017–2019Based in Oyama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| GIGAPHOTON INC | 16 | 2006–2019 |
| SOUMAGNE GEORGself | 11 | 2011–2013 |
| UENO YOSHIFUMI | 7 | 2011–2013 |
| WAKABAYASHI OSAMU | 6 | 2012–2013 |
| ENDO AKIRA | 4 | 2011–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hiratsuka, JP | 8 | 2011–2013 |
| Kamakura, JP | 5 | 2011–2013 |
| Oyama, JP | 3 | 2017–2019 |
| Oiso, JP | 1 | 2006 |