Inventor
Teppei Adachi
Inventor
Joetsu-shi, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
C07CAcyclic or carbocyclic compounds8%
C07DHeterocyclic compounds8%
H01LSemiconductor devices8%
C08LCompositions of macromolecular compounds4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
B05DProcesses for applying fluent materials to surfaces, in general2%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%
PatentTitleYear
10,457,761Polymer, resist composition, and pattern forming process201910,310,376Resist composition, pattern forming process, polymer, and monomer201910,191,373Method for producing polymer201910,023,674Monomer, polymer, resist composition, and patterning process201810,012,902Positive resist composition and pattern forming process20189,904,169'Photomask blank, resist pattern forming process, and method for making photomask'20189,846,360Resist composition and patterning process20179,829,792Monomer, polymer, positive resist composition, and patterning process20179,760,010'Patterning process'20179,429,846'Pattern forming process and shrink agent'20169,360,760'Pattern forming process and shrink agent'20169,146,464'Sulfonium salt, polymer, polymer making method, resist composition, and patterning process'20159,091,918'Sulfonium salt, polymer, resist composition, and patterning process'20159,017,931'Patterning process and resist composition'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2019Patents assigned to SHINETSU CHEMICAL CO (14)· patent assignee history
2015–2019Based in Joetsu-shi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 14 | 2015–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Joetsu-shi, JP | 14 | 2015–2019 |