Inventor
Takeshi Sasami
Inventor
Joetsu-shi, JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%
C07CAcyclic or carbocyclic compounds14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
C07DHeterocyclic compounds7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
A61KPreparations for medical, dental or toiletry purposes2%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations2%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium2%
C07HSugars2%
PatentTitleYear
10,520,809Resist composition and patterning process201910,474,030Resist composition and patterning process201910,078,264Resist composition, patterning process, and barium, cesium and cerium salts20189,261,783'Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid'20169,115,074'Fluorinated monomer, polymer, resist composition, and patterning process'20158,916,331'Resist composition and patterning process'20148,815,492'Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process'20148,697,903'Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid'20148,647,808'Fluorinated monomer, polymer, resist composition, and patterning process'20148,420,292'Polymer, resist composition, and patterning process'20137,851,157'Oligonucleotide derivative, probe for detection of gene, and DNA chip'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010Based in Yokohama, JP· patent location history
2013–2019Patents assigned to SHINETSU CHEMICAL CO (10)· patent assignee history
2013–2014Patents assigned to SASAMI TAKESHI (5)· patent assignee history
2013–2014Patents assigned to HASEGAWA KOJI (4)· patent assignee history
2013–2014Patents assigned to HARADA YUJI (3)· patent assignee history
2013–2014Patents assigned to SUKA YUUKI (2)· patent assignee history
2013–2019Based in Joetsu-shi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 10 | 2013–2019 |
| SASAMI TAKESHIself | 5 | 2013–2014 |
| HASEGAWA KOJI | 4 | 2013–2014 |
| HARADA YUJI | 3 | 2013–2014 |
| SUKA YUUKI | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Joetsu-shi, JP | 10 | 2013–2019 |
| Yokohama, JP | 1 | 2010 |