Inventor
Toyoji Ito
Inventor
Shiga, JP
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices38%
H10BElectronic memory devices28%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1015%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H01GCapacitors3%
H01LSemiconductor devices3%
H05BElectric heating3%
H10KOrganic electric solid-state devices3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
9,548,452'Method for manufacturing organic EL display panel and system for manufacturing organic EL display panel'20177,776,707'Method for manufacturing dielectric memory'20107,615,814'Ferroelectric device having a contact for taking the potential of a metal film and a plurality of capacitors positioned periodically'20097,550,344'Semiconductor device and method for fabricating the same'20097,288,456'Semiconductor device and method for fabricating the same'20077,268,036'Semiconductor device and method for fabricating the same'20077,265,403'Semiconductor device'20077,238,609'Method for fabricating semiconductor device'20077,132,709'Semiconductor device including a capacitor having a capacitive insulating film of an insulating metal oxide'20066,956,729'Capacitor element and production thereof'20056,943,398'Semiconductor device and method for fabricating the same'20056,831,323'Semiconductor device and method for fabricating the same'20046,809,000'Semiconductor device and method for fabricating the same'20046,730,560'Method for fabricating semiconductor device'20046,624,076'Semiconductor device and method for fabricating the same'20036,239,462'Semiconductor capacitive device having improved anti-diffusion properties and a method of making the same'20015,840,200'Method of manufacturing semiconductor devices'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2001Patents assigned to MATSUSHITA ELECTRONICS CORP (2)· patent assignee history
1998–2009Based in Shiga, JP· patent location history
2003–2007Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (11)· patent assignee history
2005–2006Based in Otsu, JP· patent location history
2009–2010Patents assigned to PANASONIC CORP (3)· patent assignee history
2009–2010Based in Toyama, JP· patent location history
2017Patents assigned to JOLED INC (1)· patent assignee history
2017Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 11 | 2003–2007 |
| PANASONIC CORP | 3 | 2009–2010 |
| MATSUSHITA ELECTRONICS CORP | 2 | 1998–2001 |
| JOLED INC | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shiga, JP | 12 | 1998–2009 |
| Toyama, JP | 2 | 2009–2010 |
| Otsu, JP | 2 | 2005–2006 |
| Tokyo, JP | 1 | 2017 |