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Inventor

Hitoshi Kato

Inventor
Iwate, JP

Overview

4→
Patents
2021
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01JElectric discharge tubes or discharge lamps17%
H01LSemiconductor devices17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
11,118,267Substrate processing method202111,118,265Film deposition method and computer program storage medium202111,085,113Film forming method and recording medium202111,075,074Method for depositing a silicon nitride film and film deposition apparatus2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
2021Based in Iwate, JP· patent location history
2021Based in Oshu, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD42021
Locations
LocationPatentsSpan
Iwate, JP22021
Oshu, JP22021