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Inventor

Isao Nishimura

Inventor
Tokyo, JP

Overview

46→
Patents
1990–2021
Patent span
Physics
Primary field (CPC G)

Patents· 46 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
F16FSprings7%
E04HBuildings or like structures for particular purposes6%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
B29CShaping or joining of plastics4%
C08LCompositions of macromolecular compounds4%
E04BGeneral building constructions4%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables3%
PatentTitleYear
11,134,568High-frequency circuit laminate and method for producing same, and B-stage sheet202111,046,024Apparatus for manufacturing fiber-reinforced material piece202110,836,111Method for manufacturing reinforcing fiber base material, and reinforcing fiber base material202010,406,795Feed device for reinforcing fiber material and method for cutting reinforcing fiber material by using the feed device201910,272,426Method of producing microfluidic device, microfluidic device, and photosensitive resin composition201910,167,158Slitter device20199,636,903'Lay-up-position correcting method for automatic lay-up machine'20179,348,226'Radiation-sensitive resin composition'20169,096,402'Sheet material supplying device'20158,043,786'Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions'20117,733,513'Image forming apparatus'20107,715,065'Image processing apparatus and image forming apparatus'20107,638,261'Radiation-sensitive resin composition'20097,531,286'Radiation-sensitive resin composition'20097,521,169'Radiation-sensitive resin composition'20097,517,634'Photoresist polymers'20097,510,817'Photoresist polymer compositions'20097,399,806'Synthesis of photoresist polymers'20087,297,461'Radiation sensitive resin composition'20077,250,475'Synthesis of photoresist polymers'20077,205,085'Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern'20077,125,647'Radiation-sensitive composition changing in refractive index and utilization thereof'20067,114,253'Male terminal fitting and method of manufacturing the same'20067,108,954'Radiation-sensitive composition changing in refractive index and method of changing refractive index'20067,071,255'Radiation-sensitive composition capable of having refractive index distribution'20066,994,944'Radiation sensitive resin composition, cathode separator and EL display device'20066,828,078'Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern'20046,797,450'Radiation-sensitive composition, insulating film and organic EL display element'20046,756,165'Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element'20046,752,669'Male terminal fitting and method of manufacturing the same'20046,677,419'Preparation of copolymers'20046,655,676'Image formation apparatus'20036,399,267'Radiation sensitive resin composition and use of the same in an interlaminar insulating film'20026,096,994'Automatic welding condition setting device'20005,958,648'Radiation sensitive resin composition'19995,487,534'Laminated rubber vibration control device for structures'19965,447,001'Vibration control device for structure'19955,442,883'Vibration control device for structure'19955,421,129'Vibration control device for structure'19955,410,845'Vibration control device for structure'19955,339,580'Laminated rubber building support and vibration damping device'19945,313,692'Warp yarn breakage detecting system'19945,177,915'Elasto-plastic damper'19935,065,555'Elasto-plastic damper'19915,022,201'Apparatus for accelerating response time of active mass damper earthquake attenuator'19914,901,486'Elasto-plastic damper'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–1996Patents assigned to KAJIMA CORP (10)· patent assignee history
1990–2019Based in Tokyo, JP· patent location history
1994–2021Patents assigned to TSUDAKOMA IND CO LTD (7)· patent assignee history
1999–2021Patents assigned to JSR CORP (21)· patent assignee history
1999–2009Based in Mie, JP· patent location history
2003–2010Patents assigned to RICOH KK (3)· patent assignee history
2004–2009Based in Yokkaichi, JP· patent location history
2007–2008Patents assigned to SYMYX TECHNOLOGIES INC (2)· patent assignee history
2015–2020Based in Kanazawa, JP· patent location history
2019–2021Based in Ishikawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP211999–2021
KAJIMA CORP101990–1996
TSUDAKOMA IND CO LTD71994–2021
RICOH KK32003–2010
SYMYX TECHNOLOGIES INC22007–2008
Locations
LocationPatentsSpan
Tokyo, JP231990–2019
Kanazawa, JP42015–2020
Mie, JP41999–2009
Yokkaichi, JP32004–2009
Ishikawa, JP22019–2021