Inventor
Myoung-Soo Lee
Inventor
Gyeonggi-do, KR
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
B82YSpecific uses or applications of nanostructures12%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein8%
H01LSemiconductor devices6%
H10KOrganic electric solid-state devices6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
G02BOptical elements, systems or apparatus4%
G06FElectric digital data processing4%
G21KHandling of particles or ionising radiation not otherwise provided for4%
PatentTitleYear
11,031,352Routing design of dummy metal cap and redistribution line202110,120,224Curved cover for curved display and curved type display apparatus including the same20189,860,942'Organic light emitting diode display device'20189,817,261'Curved cover for curved display and curved type display apparatus including the same'20179,583,728'Organic light emitting device'20179,252,385'Organic light emitting device'20169,169,409'Ink composition for imprint lithography and roll printing'20158,936,898'Photosensitive resin composition for imprinting process and method for forming organic layer over substrate'20158,522,172'Method of forming photomask using calibration pattern, and photomask having calibration pattern'20138,213,722'Method for inspecting critical dimension uniformity at high speed measurement'20128,137,870'Method of manufacturing photomask'20128,007,963'Photomask'20117,935,552'Ink composition and method of fabricating liquid crystal display device using the same'20117,812,929'Electrostatic chuck with temperature sensing unit, exposure equipment having the same, and method of detecting temperature from photomask'20107,763,397'Photomask registration errors of which have been corrected and method of correcting registration errors of photomask'20107,646,472'Off-axis illumination apparatus, exposure apparatus and off-axis illumination method'20107,630,079'Equipment and method for measuring transmittance of photomask under off axis illumination'20097,247,412'Method of correcting deviations of critical dimensions of patterns formed on a wafer in a EUVL process'20076,631,224'Tunable filter with core mode blocker'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2013Patents assigned to SAMSUNG ELECTRONICS CO LTD (9)· patent assignee history
2007–2017Based in Gyeonggi-do, KR· patent location history
2010–2013Based in Suwon-si, KR· patent location history
2011–2018Patents assigned to LG DISPLAY CO LTD (8)· patent assignee history
2012–2013Patents assigned to KIM HEE-BOM (3)· patent assignee history
2012–2013Patents assigned to LEE MYOUNG-SOO (3)· patent assignee history
2012Patents assigned to SUNG YOUNG-SU (2)· patent assignee history
2017–2018Based in Paju-si, KR· patent location history
2018Based in Seoul, KR· patent location history
2021Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 9 | 2007–2013 |
| LG DISPLAY CO LTD | 8 | 2011–2018 |
| KIM HEE-BOM | 3 | 2012–2013 |
| LEE MYOUNG-SOOself | 3 | 2012–2013 |
| SUNG YOUNG-SU | 2 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Gyeonggi-do, KR | 8 | 2007–2017 |
| Suwon-si, KR | 6 | 2010–2013 |
| Paju-si, KR | 2 | 2017–2018 |
| Hsinchu, TW | 1 | 2021 |
| Seoul, KR | 1 | 2018 |