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Inventor

Michael Kocsis

Inventor
San Francisco, CA, US

Overview

2→
Patents
2016–2020
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
C23CCoating metallic material20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
10,642,153Organometallic solution based high resolution patterning compositions and corresponding methods20209,281,207'Solution processible hardmasks for high resolution lithography'2016

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016–2020Patents assigned to INPRIA CORP (2)· patent assignee history
2016Patents assigned to GRENVILLE ANDREW (1)· patent assignee history
2016Patents assigned to KESZLER DOUGLAS A (1)· patent assignee history
2016Patents assigned to KOCSIS MICHAEL (1)· patent assignee history
2016Patents assigned to MEYERS STEPHEN T (1)· patent assignee history
2016–2020Based in San Francisco, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INPRIA CORP22016–2020
GRENVILLE ANDREW12016
KESZLER DOUGLAS A12016
KOCSIS MICHAELself12016
MEYERS STEPHEN T12016
Locations
LocationPatentsSpan
San Francisco, California, US22016–2020