Inventor
SATISH RADHAKRISHNAN
Inventor
US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
C23CCoating metallic material22%
H01LSemiconductor devices18%
H01JElectric discharge tubes or discharge lamps12%
H10KOrganic electric solid-state devices6%
G05BControl or regulating systems in general4%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation4%
B05BSpraying apparatus2%
B08BCleaning in general2%
H05BElectric heating2%
PatentTitleYear
12,563,991Thermal choke plate202612,557,254Two-piece RF shield design202612,473,639Methods for forming films on substrates202512,442,079Dual channel showerhead assembly202512,438,011Apparatus and method for controlling a flow process material to a deposition chamber202512,062,567Systems and methods for substrate support temperature control202412,043,895Methods of using a segmented showerhead for uniform delivery of multiple pre-cursors202411,970,775Showerhead for providing multiple materials to a process chamber202411,835,927Reducing substrate surface scratching using machine learning202311,834,743Segmented showerhead for uniform delivery of multiple precursors202311,830,706Heated pedestal design for improved heat transfer and temperature uniformity202311,692,261Evaporator chamber for forming films on substrates202311,682,544Cover wafer for semiconductor processing chamber202311,600,470Targeted heat control systems202311,586,160Reducing substrate surface scratching using machine learning202311,515,176Thermally controlled lid stack components202211,515,129Radiation shield modification for improving substrate temperature uniformity202211,505,863Methods for forming films on substrates202211,393,703Apparatus and method for controlling a flow process material to a deposition chamber2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to APPLIED MATERIALS INC (19)· patent assignee history
2022–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 19 | 2022–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 19 | 2022–2026 |