LexDanaLexDanabeta
Inventor

Barbara Lorenz

Inventor
Dresden, DE

Overview

3→
Patents
2001–2007
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
H10BElectronic memory devices25%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
H10DInorganic electric semiconductor devices13%
PatentTitleYear
7,265,025'Method for filling trench and relief geometries in semiconductor structures'20076,984,556'Method of forming an isolation layer and method of manufacturing a trench capacitor'20066,245,640'Method for fabricating a semiconductor structure'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Patents assigned to SIEMENS AG (1)· patent assignee history
2001–2007Based in Dresden, DE· patent location history
2006–2007Patents assigned to INFINEON TECHNOLOGIES AG (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INFINEON TECHNOLOGIES AG22006–2007
SIEMENS AG12001
Locations
LocationPatentsSpan
Dresden, DE32001–2007