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Inventor

Yasuhiro Mikawa

Inventor
Shunan-shi, JP

Overview

3→
Patents
1995–2013
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients25%
C08LCompositions of macromolecular compounds25%
PatentTitleYear
8,431,333'Method for removing an uncured photosensitive composition'20138,153,357'Photosensitive composition remover'20125,395,895'Resin composition and a molded article utilizing it'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2013Patents assigned to SHOWA DENKO KK (3)· patent assignee history
1995Based in Oita, JP· patent location history
2012–2013Patents assigned to KANEDA MASATO (2)· patent assignee history
2012–2013Patents assigned to MIKAWA YASUHIRO (2)· patent assignee history
2012–2013Patents assigned to SHIMIZU KOJI (2)· patent assignee history
2012–2013Patents assigned to TERAO KOUICHI (2)· patent assignee history
2012–2013Based in Shunan-shi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHOWA DENKO KK31995–2013
KANEDA MASATO22012–2013
MIKAWA YASUHIROself22012–2013
SHIMIZU KOJI22012–2013
TERAO KOUICHI22012–2013
Locations
LocationPatentsSpan
Shunan-shi, JP22012–2013
Oita, JP11995