Inventor

Chen-Peng Fan

Inventor

Hsin Chu Hsien, TW

Overview

13→

Patents

1999–2010

Patent span

Electricity

Primary field (CPC H)

Patents· 13 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1024%

H10DInorganic electric semiconductor devices14%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

B24BMachines, devices, or processes for grinding or polishing5%

C25DProcesses for the electrolytic or electrophoretic production of coatings5%

H01JElectric discharge tubes or discharge lamps5%

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%

PatentTitleYear

7,772,625'Image sensor having an RPO layer containing nitrogen'2010 7,481,910'Method and apparatus for stabilizing plating film impurities'2009 7,122,471'Method for preventing voids in metal interconnects'2006 6,897,147'Solution for copper hillock induced by thermal strain with buffer zone for strain relaxation'2005 6,524,959'Chemical mechanical polish (CMP) planarizing method employing derivative signal end-point monitoring and control'2003 6,376,156'Prevent defocus issue on wafer with tungsten coating on back-side'2002 6,248,661'Method for monitoring bubble formation and abnormal via defects in a spin-on-glass planarization, etchback process'2001 6,110,843'Etch back method for smoothing microbubble-generated defects in spin-on-glass interlayer dielectric'2000 6,031,264'Nitride spacer technology for flash EPROM'2000 6,001,690'Method of forming flash EPROM by using iso+aniso silicon nitride spacer etching technology'1999 5,930,664'Process for preventing corrosion of aluminum bonding pads after passivation/ARC layer etching'1999 5,879,993'Nitride spacer technology for flash EPROM'1999 5,868,853'Integrated film etching/chamber cleaning process'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2010Patents assigned to TAIWAN SEMICONDUCTOR MFG (13)· patent assignee history

1999–2003Based in Hsin Chu Hsien, TW· patent location history

1999–2009Based in Hsinchu County, TW· patent location history

2000Based in Hsin Chu, TW· patent location history

2001–2006Based in Hsinchu, TW· patent location history

2010Based in Jhudong Township, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG	13	1999–2010

Locations

Location	Patents	Span
Hsin Chu Hsien, TW	4	1999–2003
Hsinchu County, TW	3	1999–2009
Hsinchu, TW	3	2001–2006
Jhudong Township, TW	1	2010
Hsin Chu, TW	1	2000