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Inventor

Chika Harada

Inventor
Osaka, JP

Overview

2→
Patents
2011–2012
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
8,278,014'Photomask and pattern formation method using the same'20127,998,641'Photomask and pattern formation method using the same'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2012Patents assigned to PANASONIC CORP (2)· patent assignee history
2011–2012Based in Osaka, JP· patent location history
2012Patents assigned to HARADA CHIKA (1)· patent assignee history
2012Patents assigned to IRIE SHIGEO (1)· patent assignee history
2012Patents assigned to MISAKA AKIO (1)· patent assignee history
2012Patents assigned to NAKAMURA TETSUYA (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
PANASONIC CORP22011–2012
HARADA CHIKAself12012
IRIE SHIGEO12012
MISAKA AKIO12012
NAKAMURA TETSUYA12012
Locations
LocationPatentsSpan
Osaka, JP22011–2012